"Best Focus Analysis - Video"
A sample video showing how Best Focus is calculated from Feature Size using Weir PW
Download Video:
Dataset #1.zip (6 meg)
Dataset #2 Video (15 meg)
Directions
Download the two "zip" file.
Unzip their contents into the two windows "AVI" video files.
Open with Windows media player or any other compatible files.
TEA Systems
TEA Systems offers products to model films, photomasks, wafers, feature profiles, process and lens data for characterization and setup of semiconductor design, simulators, tools and the process.
TEA Systems, a privately held corporation since 1988, specializes in advanced, intelligent modeling of the semiconductor process and toolset. Products from TEA allow the user to decouple process, tool and random perturbations for enhanced process setup & control.
TEA Systems products include:
Weir PSFM: Full-wafer/field/scan analysis tool for FOCUS derived from proprietary defocus sensitive features.
Weir PW: Reticle/Full-wafer/field/scan analysis for any metrology with advanced process window capabilities for both wafer and photomask control.
LithoWorks PEB: A tool to link and correlate profile, film and critical element control to thermal reactions such as PEB and ChillPlate
Weir DMA: Macro Automation interface for Weir PSFM and Weir PW for external program calling, automated data gathering or one-button analysis of commonly used sequences. Includes data trending and web interface.
ã Copyright 2006 TEA Systems Corporation, All rights reserved. Legal
TEA Systems Corp. | Tel: +1 610 682 4146
65 Schlossburg St., Alburtis, PA USA
