- Any film or feature metrology data
- Drag & drop file loading
- CD-sem metrology, overlay, scatterometry, simulation output etc
- Custom reticle data
- Simulation outputs, Focus-Exposure Matrix spreadsheets and much more.
- Open, documented data and report formats
Storage & Reporting
- Microsoft Excel TM Spreadsheets and workbooks
- HTML Reports; many reports are generated and stored in the data's Weir Workbook. Reports and graphics can be saved into HTML format for display on any web site.
- Open system; access to all raw, calculated and modeled data.
Reticle & Photomask
Data encapsulation for signature transmission
New design qualification
In-process reticle validation
Feature derivation from semiconductor imaging
Signature removal for semiconductor process setup.
Reticle library entry
Results feedback and verification
Profile validation n and optimization
Process tolerance derivation for Design for Manufacture
MEF (Mask Error Factor)
Full-field uniformity for exposure qualification
feature & site specific derivation
Reticle feature signature derivations
Lot, wafer, reticle, field, lens and scan signature derivation
Process window extrapolation
Feature response confirmation
OPC, etch and dose bias signatures
Characterization & Optimization
Focus and dose signature mapping
Reticle stage direction sensitivity mapping
Reticle bow mapping
Reticle Enhancement Technique (RET) results
Reticle feature derivation from wafers images
Optical Proximity Correction(OPC) tuning
IsoFocal response plots
Exposure tool stage, wafer-leveling, scan direction, lens slit performance on profiles,
Process setup; multi- feature & film
Exposure tool specific, full-field process windows
Reticle and wafer signature removal
MEF uniformity and stability
Hot plate setup and thermal correlation.
Process Window Analysis
enhanced full-spectrum model and analysis
user selected features and field-site locations
reticle site-uniformity estimation mapping
reticle qualification and validation
Film and critical feature
automated error-budget and precision calculation.
exposure uniformity and spatial characterization.
scan dose-linearity analysis
wafer, field, slit, scan and site perturbation analyses.
model and simulations for “what-if” scenario queries during tool tuning sequence.
2D and 3D control surface mapping.
bias surface mapping to reticle feature and load-level.
optional removal of selected modeled, raw and reticle errors before analysis.
Exposure Tool and Metrology
characterization and critical setup
error-budget and electro-mechanical precision module.
performance models and variable covariance mapping.
Reticle performance evaluation
Reticle Enhancement Technique (RET) optimization
Feature and film profile mapping
Deposition, etch and film uniformity modeling
Exposure; source and uniformity mapping
Film uniformity mapping
Performance and process daily monitor
Weir PW is a engineering tool for process and equipment engineers. Part of the Weir Engineering Software Suite, Weir PSFM and Weir PW provide complete and comprehensive tools for control of the lithographic tool and process environment.
Use Weir PW for both process and tool:
Critical Dimension (CD) and film distribution calculations
Correlate, model and simulate spatial distributions of features.
Model systematic performance for wafer, field, slit and scan.
Discriminate wafer chuck from reticle platen tilt and bow.
Automatically remove selected wafer and reticle systematic errors prior to process window and other calculations
Calculate and plot metrology and process variable covariance.
Calculate the true Process Window for:
multiple feature types
multiple sites across the field
multiple values of Numeric Aperture (NA), PC (Partial Coherence inner & outer) and stage/slit scan direction.
Interactive process window viewing of Depth-of-Focus and exposure latitude tradeoffs.
Weir PW automatically imports and formats data from SEM’s, scatterometry, simulations, ELM, Optical and X-ray tools. Automated and manual mouse- interactive data culling methods are employed. Software can be used as an APC or tool tuning module. Output can be paper or binary media with control element output to optimize tool settings.
Data import is set up using a simple windows-graphic controls. The system is an “open” tool with data stored and easily accessed using Microsoft Excel Spreadsheets. Worksheet macros are not used but can be user-added if desired.
Automatically converts any data into Excel Spreadsheets.
Easy sub-set data selection; automated and manual
Data culling ... automated by wafer, field, site, range, NA, PC (Sigma) and manual mouse-selection.
Import of any metrology data set and process simulator output
Export reports and graphics
Spreadsheet access to data, graphics and sub-analyses
Scope of Application
Analyze wafer, field and sub-field induced aberrations.
Remove user-selected modeled wafer and field errors prior to calculation.
Multiple full-wafer and field models
Proprietary adaptive model engines;
Raw data, modeled, simulated and residual spatial analysis interface
Serially linked wafer, field and slit/scan model sequence.
model coefficient removal and simulator for “What If?” scenario investigations during tool setup
Automated precision and error budget calculation for metrology, exposure and process
Metrology tool characterization through automated error-budget calculations
Scatterometry and ellipsometric algorithm validation for breadth of validity, matching and precision.
Metrology feature and process correlations with variable covariance matrices.
Focus, dose-latitude and process-window analyses.
Multiple graphics for evaluation of dose, focus and process window.
User control over process window limits, working point, graphic selection and display format, features and fields sites included in the analysis.
Best Focus field mapping from critical features
Depth-of-Focus, full-field mapping
Optimized feature uniformity mapping
Reticle signature estimation
Exposure dose uniformity mapping
Object-oriented structure with point-and-click graphics and culling.
Drill down data visualization and data-subset modeling
Advanced graphics including histograms, vector, range, XYplot , contour, bulls-eye, box-plots, population density and 3D plotting.
See the Software Requirements Specification for this product for more detail.
Weir PW© is a compiled application with a full object oriented, mouse-interactive interface. Drill down graphics and spreadsheet analysis supported. Functional on Windows 2000, XP etc.. Microsoft Excel© is required.