Semiconductor data modeling for tool, process and yield

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TEA Systems offers on-site classes that address advanced modeling techniques used in the industry for calibration, characterization and process control.

 Understanding, recognizing and finding Astigmatism using focus and critical feature data.
   

Exposure Tool APC methods

and

calibration using control models

Lithography control and characterization --

thru implementation of the new critical feature and wavefront technologies

   

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