TEA Systems news - New product release for Advanced Double Patterning Lithograph

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Vector Raptor 

TEA Systems announces a new and powerful tool for 

Advanced Overlay & Double Patterning

Model Editor Interface and Library Maintenance


 Download Manual Segment: Portable document (pdf) version

On-Line Brochure (html): Vector Raptor

Portable Document Brochure (pdf): Vector Raptor


Online video Tutorials

Model Editor Video



Allentown, PA (USA). October 2, 2007 -- TEA Systems has announced the release of a new interface for Vector Raptor overlay and double patterning lithography (DPL) control.

Problem: The vast majority of the variation found in metrology data in semiconductor manufacturing is based upon systematic error sources. Systematic error sources are found and deconvolved best by data modeling. However, Overlay and Registration Models have changed little since the introduction of the step-and-repeat camera in the mid-1980’s. While simulators have been the major focus for setup efforts in the recent past, data models have not maintained pace with advances in the optics and increases in process complexity.

Solution: New models are needed to properly handle process and step-and-scan error sources. User-customized models provide the optimal method of analysis development by providing the ability of each user to develop, test and maintain a library of proprietary models and calculation sequences.

Applications: Proprietary Models provide a unique opportunity to optimize exposure tool setup, control, and monitoring. Proven models can be employed in Advanced Process Control, process optimization, design validation and split lot performance evaluations.

Platform: The Weir Overlay Model Editor can be installed on any windows PC. The software develops and uses models associated with the Weir Overlay software from TEA Systems Corporation. Microsoft ExcelŽ software is required.

VR Model Editor interface & Excel Workbook data storage

About TEA Systems

TEA Systems, a privately held corporation since 1988, specializes in advanced, intelligent and adaptive process modeling of the photomask, semiconductor process and it's toolsets. Products from TEA allow the user to decouple process, tool and random perturbations to enhance process setup, control and yield.

TEA Systems products include:

Weir PSFM: Full-wafer/field/scan analysis tool for FOCUS derived from proprietary defocus sensitive features.

Weir PW:    Reticle/Full-wafer/field/scan/process data modeling for any metrology with advanced process window capabilities. Product is capable of addressing both wafer and photomask process control.

Weir DMA:  Macro Automation interface for Weir PSFM and Weir PW for external calling, automated data gathering or one-button analysis of commonly used sequences. Includes data trending.

Weir TR:     A tool to link and correlate profile, film and critical element control to thermal reactions such as PEB and ChillPlate

Vector Raptor: Advanced overlay process control for Double Patterning, simulation and feature design optimization.

See us at http://www.TEAsystems.com for a free demonstration or evaluation.

News and Information: http://www.TEAsystems.com/NewsReleases.htm

Contact: Sales@TEAsystems.com or

               Terrence Zavecz

Phone: +1 610 682 4146

Cell:      +1 610 462 0706


TEA Systems Corp. | Tel: +1 610 682 4146
65 Schlossburg St., Alburtis, PA USA

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