TEA Systems news - New product release for Advanced Double Patterning Lithograph
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TEA Systems announces new features for
Simulation & Lot Correction Optimizer
specialized features for Double Patterning
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On-Line Brochure (html): Vector Raptor
Portable Document Brochure (pdf): Vector Raptor
Allentown, PA (USA). Sept. 24, 2007 -- TEA Systems has announced the release of a new features and tools for Vector Raptor overlay and double patterning lithography (DPL) control.
The results from a calculation of the systematic variations in overlay modeled data can be used as a feedback mechanism to scanner positioning or as a highly accurate method of estimation of positioning errors in locations on the field, wafer or lot not actually measured. Two tabs appear after a modeled data analysis as shown in figure Sim1. These tabs provide utilities to assist in the evaluation of lot-correction techniques and in the visualization of performance through simulation.
Full-wafer overlay Simulation employs the
systematic errors of the process to estimate distributions and is significantly
more accurate than a corresponding statistical calculation that assumes a random
distribution of the process errors. As a result this is the preferential method
of advanced users for pass/fail or lot-gating metrics in the lithography
sequence. The method however is rarely used for IntraField analyses and the full
potential of the technique has therefore not be realized by the industry.
Should corrections use the average of all wafers and fields measured in a calibration sequence or should more sophisticated alignment schemes employ finer levels of averaging?
The following dataset illustrates the need for a Lot Correction Optimizer. The plot on the left side of Figure Sim-1 replicates a set of data on a wafer that contains only a wafer-rotation error.
If a simple field model of the form dx = A +BX –CY is applied to each field on the wafer, then the overlay distortion can be accurately calculated as shown in the figure on the right side of Sim-1. Notice that the model only needed to fit each individual field’s offset in order to successfully match the errors found on the wafer. The average field offset for the wafer is (X,Y) =(-0.586, -1.125) nm
If, as is common in production, the average field offset value were then used to correct for overlay error in the lot, the correction would be applied as shown in the left side of figure Sim-2. Unfortunately for this type of error, the wafer-rotation is not corrected and will show up in the residuals to the average field as is shown in the right side of figure Sim-2. This implies that any product lots exposed using the field-average correction on this tool/reticle combination will also result in an overlay distribution as shown in these residuals.
Vector Raptor’s Lot Overlay Correction Optimizer provides the tools needed to discover the results that can be obtained through the use of lot-coefficient-averaging of corrections. Averaging schemes for lot, wafer and field based correction averaging can be combined with selective inclusion of individual coefficients to exposure the optimum strategy for minimization of errors due to processing, bake, lens/reticle heating, film stress and other highly systematic errors.
About TEA Systems
TEA Systems, a privately held corporation since 1988, specializes in advanced, intelligent and adaptive process modeling of the photomask, semiconductor process and it's toolsets. Products from TEA allow the user to decouple process, tool and random perturbations to enhance process setup, control and yield.
TEA Systems products include:
Weir PSFM: Full-wafer/field/scan analysis tool for FOCUS derived from proprietary defocus sensitive features.
Weir PW: Reticle/Full-wafer/field/scan/process data modeling for any metrology with advanced process window capabilities. Product is capable of addressing both wafer and photomask process control.
Weir DMA: Macro Automation interface for Weir PSFM and Weir PW for external calling, automated data gathering or one-button analysis of commonly used sequences. Includes data trending.
Vector Raptor: Advanced overlay process control for Double Patterning, simulation and feature design optimization.
See us at http://www.TEAsystems.com for a free demonstration or evaluation.
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Phone: +1 610 682 4146
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