Weir DM Macro Setup for PW

Weir DM (Daily Monitor) provides a means of using complex engineering analysis sequences and models in production. The goal of Weir DM is to simplify often repeated analyses by creating a Weir Macro control sequence that reduces the complexity to a simple selection of data from a drop down list.

Weir DM results for the current file are presented in graphics and variables selected by the user during setup of the Macro. Similarly, user-selected variables resulting from the analysis are entered into interactive trend charts stored in the Weir Macro Workbook. In this manner the stability of a process, tool or sequence can be monitored over extended periods.

One license of Weir DM is included with every purchase of Weir PW or Weir PSFM. Additional fixed or floating licenses can be purchased from TEA Systems.

Weir DMA (Daily Monitor Automated) can be used to automate the calling sequence from other process control or factory automation software. Weir DMA can be used to automatically gather and analyze production data. The software also provides a sophisticated modeling module for Advanced Process Control (APC) tools.

Weir DMA call strings allow the multiple data sets to be analyzed using any number of Weir DM Macro as templates. An automated log-file tracks the progress and can be used for problem solving as well.

The results calculated by Weir DMA can be sent to any destination in ASCII text file, Microsoft Excel Workbook or web-page (HTML) format. Format and destination values are part of the calling string.

Focus Mapping
- Lens and Scanner Autofocus data
  - Use FOCAL, PGM, PSFM, Z-spin or any other specialty pattern offset data.
  - Full-Wafer analysis is available with PSFM, PGM and Z-spin
  - Commercial or scanner specified models can be applied.
  - Focus stability/ Best Focus mapping
  - Scan, slit and wafer perturbation flatness maps
- Feature Response
  - Optical Proximity Correction (OPC) validation, tuning and characterization
  - Immersion Depth-of-Focus field mapping
  - Full-Field Focus uniformity mapping
  - End-of-Line and proximity response derivation
Reticle feature Discovery
- Reticle feature size from wafer data
- Feature optimum (natural or isofocal) size
- Isofocal surface analysis
- Dose, Focus, Exposure Latitude (EL), Depth-of-Focus mapping
- Process window variation across full-field
  - dose mapping
  - optimal control limit calculation
- Optimal etch depth for phase masks
- Polarization and aperture illumination optimization

Process Response Surface
- Full-field process window map
- Effective dose mapping
- Orientation, proximity and phase response
- Exposure latitude response to focus and dose.
- AntiReflective Coating (ARC) efficiency
- Film thickness changes with dose, feature and sub-structure
- Dose matching
- Bake oven uniformity
- Metrology charging and drift
Reticle Characterization and Qualification
- Maskshop process control
- Maskshop focus & dose setup
- Reticle feature mapping
Feature Performance Characterization
- Forbidden pitch mapping
- Isofocal dose and bias map
- End/Start of scan dose and profile variance
Exposure Tool (Scanner)
- Dose and Focus uniformity mapping
- Exposure optimization
- Phase and polarization uniformity maps
- Reticle-scan focus and dose influence
- reticle bias analysis
- scan-direction influence
- Lens Heating

Any of the Weir Reports are in Microsoft Excel spreadsheet format. This means you can publish modify, annotate and publish them to any web site by the the "File/SaveAs" menu command and selecting the "html" format. To add a graph to the report simply use the "Edit/Copy graphic" menu command and then past it into the report spreadsheet and then SaveAs HTML format.

Introduction

TEA Systems