TEA Systems news - New product release for Advanced Double Patterning Lithograph
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TEA Systems Announces the release of a new product for
Advanced Overlay Control
in sub-45 nm node lithography with
specialized features for Double Patterning
and Design Matching
Download News: Portable document (pdf) version
On-Line Brochure: Vector Raptor
Portable Document Brochure: Vector Raptor (pdf)
Allentown, PA (USA). July 1, 2007 -- TEA Systems has announced the release of a new and unprecedented software product that enhances the control of overlay and registration in advanced semiconductor manufacturing to minimize it's influence on critical feature dimensions and yield. Vector Raptor is a seventh generation overlay control tool created by the engineers of TEA Systems and is specifically designed to address the unique problems now being introduced by Double Patterning and sub-45 nm process-node technology.
Double Patterning introduces single-layer registration errors that originate during reticle manufacturing, can be amplified during wafer processing and vary with changes in exposure of the individual feature. Current matching and modeling techniques cannot accurately deconvolve the sources of these errors that include a whole new family of overlay and feature-size product yield loss factors.
Vector Raptor (VR) provides an object-oriented, fully-interactive graphic interface for advanced control of overlay/registration with matching to any format feature-profile or film data. Common models are provided for all scanner tools and user-designed models can be added using the graphic interface of the VR Model Editor. These features combine to provide a new level of clarity in the precise resolution of each source of error and yield loss and it's correction path.
Vector Raptor uniquely provides a level of capability to the engineer never before experienced. Capabilities that include the ability to resolve the relative response of multiple feature designs, design-response to exposure and reticle-scan noise, the lens-slit signature, various contributions of the wafer-process separate from exposure-tool grid-corrections and the unique contributions of those wafer-process-sensitive perturbations of enhanced reticle designs (RET) that originate in the photomask manufacturing process.
Vector Raptor uses TEA Standard Data Format workbooks for storage of all overlay, registration and feature-profile data as well as analysis reports. TEA Systems products provide tools to easily import any format metrology data into the standard format workbooks. There is never a charge for new-format updates. Our products include full support for ASML registration, overlay and FOCAL metrology. Vector Raptor will import and model ANY form of metrology allowing the direct comparison of overlay and feature-size errors.
Vector Raptor is an interactive engineering interface over which the user has full control. The product also includes the process automation power of scripts using Weir Macros. The TEA Systems scripting interface, Weir DMA, provides easy automation of any modeling technique including user-customized reporting with automated Trend Charts of both raw and modeled results.
Fixed or floating-node licenses available.
Availability and Pricing
About TEA Systems
TEA Systems, a privately held corporation since 1988, specializes in advanced, intelligent and adaptive process modeling of the photomask, semiconductor process and it's toolsets. Products from TEA allow the user to decouple process, tool and random perturbations to enhance process setup, control and yield.
TEA Systems products include:
Weir PSFM: Full-wafer/field/scan analysis tool for FOCUS derived from proprietary defocus sensitive features.
Weir PW: Reticle/Full-wafer/field/scan/process data modeling for any metrology with advanced process window capabilities. Product is capable of addressing both wafer and photomask process control.
Weir DMA: Macro Automation interface for Weir PSFM and Weir PW for external calling, automated data gathering or one-button analysis of commonly used sequences. Includes data trending.
See us at http://www.TEAsystems.com for a free demonstration or evaluation.
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Phone: +1 610 682 4146
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