TEA Systems was founded in 1988 by Terrence Zavecz. the Corporation has
created, developed and sold control and characterization products for
Semiconductor Lithography and Photomask product markets during this
period.
Additional information can be seen in the
Corporate Background page.
Features common to all TEA Systems products can be
reviewed using the
Getting Started file.
Additional product and functional overviews-- Click to
view or Right-click to download:
File |
Type |
Size |
Description |
TEASystemsProducts07
|
ppt |
5.6 Mbytes |
Overview of TEA Systems, product features and
offerings. |
CD
Uniformity Market
|
ppt |
7.3 Mbytes |
Process control thru metrology market
applications addressed by TEA Systems Products |
CD Uniformity Overview
|
ppt |
2.6 Mbytes |
Overview of sources of CD non-uniformity as well
as methods of measurement and control. |
Reticle Haze
|
ppt |
2.6 Mbytes |
Reticle haze detection and control using Weir
PW. Also illustrates simple methods for Dose Uniformity and
Focus Uniformity process and tool modeling using in-process
control elements. |
Weir TR - Temporal Response
|
ppt |
2.5 Mbytes |
Temporal Response calculation, inflection
points, control elements, energy transferred cycle-phase
detection, sensor mapping, Rise Times and snapshot images of the
cyclic process. Methods illustrated using On-Wafer and Therma-Wave
temperature metrology. Process and Arrhenious Energy transfer
calculations. |
Vector
Raptor overview
|
ppt |
4.9 Mbytes |
Overlay Control/ Modeling: Vector Raptor |
Vector
Raptor - High Density Overlay
|
ppt |
1.4 Mbytes |
|
| |