|
Initial Reticle
Exposure- Dose Analysis |
|
Focus/Dose
analysis |
A Phase-Grating reticle (PGM) setup is performed to
determine the optimum exposure dose. |
|
Determining initial dose for PSFM/PGM reticles |
Weir PSFM utilities and the method of determining
exposure - dose for Benchmark Technologies PSFM/ PGM reticles. |
|
PSFM/ PGM Reticle
Calibration |
|
Weir
PSFM analysis flow |
Flowchart describing the calibration & conversion
flow of data to calibrate a Focus Monitor reticle and then apply the
calibration to a fixed-focus analysis of the entire wafer (PDF) |
|
PSFM 13 point -
Calibration |
A step-by-step method for calibrating a PSFM reticle,
determining precision and saving results to a template. Aerial image
analysis is demonstrated. |
|
PSFM 13 point
- Fixed Focus Analysis |
Calibration previously determined is now applied to a
full-wafer analysis of wafer and field focus aberrations. Analysis
of the across-wafer sources of focus error. |
|
PSFM
Calibration - annotated |
Step-by-step calibration of a PSFM reticle with
detailed annotations and comments |
|
Fixed
Focus PSFM scanner - annotated |
Calibration template of the previous section is
applied to a fixed-focus analysis of wafer and field
aberrations. |
|
Weir PSFM calibration |
Weir PSFM calibration example |
|
Fixed-Focus, Full
Wafer Focus Studies |
|
KLA Archer -
fixed focus analysis |
Another fixed-focus analysis using data derived from
the KLA Archer registration/overlay tool. |
|
Topography standard PGM analysis |
Etched 10 to 70 nm steps and trenches and patterns in
a wafer are used to evaluate focus sensitivity |
|
Weir Fixed Focus
Analysis |
Another example of the analysis of the magnitude and
sources focus aberration across the wafer. |
|
Wafer Edge
Focus Effects |
Techniques for modeling and analysis of focus errors on the wafers
edge. Also includes methods of data culling and wafer-radius
restriction. |
|
Wafer & Field Models |
|
Weir PSFM focus model and Weir DM features |
The model used for wafer and field analysis is
described. Additional reviews of Weir PSFM used the the Weir Daily
Monitor |
|
Weir Wafer and field models |
FOCAL data with programmed wafer tilts is analyzed
using Weir PSFM |
|
Weir PSFM & FOCAL |
|
ASML FOCAL analysis |
ASML FOCAL data is imported and a Weir PSFM
full-field model performance is compared with the FOCAL reported
values (Stepper model) |
|
Weir PSFM & FOCAL |
Weir PSFM is compared to results obtained from ASML FOCAL |
