Overlay and Registration Control for Double Patterning is critical for sub-64 nm feature-size devices. TEA Systems' products provide both overlay control and feature-size control to quantify the effects of Double-Patterning Errors.
The product features that qualify these products for double-patterning also provide precise and easy-to-use aids for the evaluation of the relative performance of test-mark designs
Double Patterning of two or more layers to achieve a single device-layer embodies new sources of registration error. Reticle-library errors such as patter-to-mark offsets, reticle processing and reticle exposure drift variations all contribute now to IntraField overlay/registration and therefore Feature-Size errors.