Overlay and Registration Control for
Double Patterning is critical for sub-64 nm feature-size devices. TEA
Systems' products provide both overlay control and feature-size control to
quantify the effects of Double-Patterning Errors.
The product features that qualify
these products for double-patterning also provide precise and easy-to-use
aids for the evaluation of the relative performance of test-mark designs
Double Patterning of two or more
layers to achieve a single device-layer embodies new sources of registration
error. Reticle-library errors such as patter-to-mark offsets, reticle
processing and reticle exposure drift variations all contribute now to
IntraField overlay/registration and therefore Feature-Size errors.